"The mind that is open to new ideas never returns to its original size." - Albert Einstein
We design, assemble and integrate our UHV cluster vacuum systems. Our current system houses interconnected MBE, 8 target turret style DC/RF sputtering, oxygen plasma, ion milling/heating station and LT-STM.
A custom built interconnected Ultra high vacuum systems for thin film growth and in-situ characterizations. This facility, unique in the country, allows in-situ transfer of samples between dedicated growth and characterization UHV chambers. Working with this sytem provides a unique blende of basic science and technology
The in-house designed 8 + 2 target DC/RF turret style sputtering chamber with local gas injection for both inert and reactive sputtering makes this system unique in its design to work on a wide range of material growth with no cross contamination. A chamber base pressure of better than 5x10-9 mbar allows us to work with epitaxial thin films.
The inhouse designed Molecular beam epitaxy (MBE) system with a base pressure of 5x10-10 mbar has a combination of 5 e-gun evaporation sources, 5 Knudsen cells with RHEED and sample station capable of substrate temperature from ~100K to 1700 K
The UHV cluster system has dedicated chambers for surface cleaning, controlled oxidation, ion milling for small area samples and heating station upto 2000K for STM surfae preparation
The VTI Cryostat with 9T field allows magnetotransport measurements from RT to 1.5K.
Our lab houses the world's first cryogen-free STM with a cryogen_free magnet capable of vertical field of 5T and an in-plane field of upto 1T.
Al wedge wirebonder
A a part of the shared facility, our cleanroom houses laser writer lithography for maskless patterning, soft lithography and SEM with E-beam lithography